Business Introduction Business 세계 최고 수준의 증착전문기업 EQ Tech Plus

Deposition Wafer for Semiconductor Evaluation

Film Depostion Service

Deposition Wafer Business

Business Flow

1

Wafer Production

si wafer

2

Film Deposition service

Deposition

3

Evaluation
  • - Equipment companies
  • - Materials companies
Process
chemical polishing
wet etching
dry etching
precursor, etc.

4

Device Manufacturing

Device

Manufacturing Film Wafer
  • Cost reduction
  • Fast delivery
  • Customization

300mm Film Wafer Specification

Film Thickness Spec.(%) *
1 Nitride Thin 50 ~ 500 Å ≤ 2.0 D
Thick 500 ~ 5,000 Å ≤ 2.0
2 Si Amorphous 500 ~ 10,000 Å ≤ 2.0 D
Poly 500 ~ 3,000 Å ≤ 2.0
3 P-TEOS 500 ~ 40,000 Å ≤ 5.0 S
4 P-SiON, P-SiN, P-SiO2 300 ~ 3,000 Å ≤ 3.0 S
5 Termal Oxide Thin ≤ 100Å ≤ 2.0 D
Thick ~ 1,000Å ≤ 2.0 D
1,000 ~ 20,000 Å ≤ 2.0 D
6 ACL (Amorphous Carbon Layer) 1,000 ~ 20,000 Å ≤ 5.0 S
7 PR( I-Line) 1 ~ 3 ㎛ ≤ 5.0 S
8 Annealing ~ 850 ℃

D : Double Side Deposition S : Single Side Deposition

EQ TECH PLUS FILM WAFER